Invention Grant
- Patent Title: Vapor chamber and manufacturing method thereof
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Application No.: US16732614Application Date: 2020-01-02
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Publication No.: US10999952B1Publication Date: 2021-05-04
- Inventor: Chun-Hung Lin , Chien-Cheng Hsu
- Applicant: TAIWAN MICROLOOPS CORP.
- Applicant Address: TW New Taipei
- Assignee: TAIWAN MICROLOOPS CORP.
- Current Assignee: TAIWAN MICROLOOPS CORP.
- Current Assignee Address: TW New Taipei
- Agency: HDLS IPR Services
- Agent Chung-Ming Shih
- Main IPC: H05K7/20
- IPC: H05K7/20 ; F28D15/02 ; F28D15/04 ; F28D15/06

Abstract:
A vapor chamber and a manufacturing method thereof are provided. The vapor chamber includes a housing, a capillary structure, at least two liquid-filling and gas-discharging pipes and a working fluid; the housing has a bottom housing plate and a top housing plate correspondingly engaged and sealed with the bottom housing plate, and a single chamber is formed between the top housing plate and the bottom housing plate; the capillary structure is disposed in the single chamber; each of the liquid-filling and gas-discharging pipes is allowed to penetrate into the housing and communicate with the single chamber; and the working fluid is disposed in the single chamber. Accordingly, the working fluid can be evenly and widely distributed in the single chamber.
Information query