Invention Grant
- Patent Title: High performance topological insulator transistors
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Application No.: US14652017Application Date: 2013-12-12
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Publication No.: US11001497B2Publication Date: 2021-05-11
- Inventor: Qiliang Li , Curt A Richter , Hao Zhu
- Applicant: Qiliang Li , Curt A Richter , Hao Zhu
- Applicant Address: US VA Fairfax; US MD Gaithersburg; US MD Gaithersburg
- Assignee: Qiliang Li,Curt A Richter,Hao Zhu
- Current Assignee: Qiliang Li,Curt A Richter,Hao Zhu
- Current Assignee Address: US VA Fairfax; US MD Gaithersburg; US MD Gaithersburg
- Agency: Ballard Spahr LLP
- International Application: PCT/US2013/074773 WO 20131212
- International Announcement: WO2014/093681 WO 20140619
- Main IPC: B82Y10/00
- IPC: B82Y10/00 ; H01L29/775 ; H01L29/06 ; H01L29/82 ; H01L29/66 ; H01L49/00 ; H01L29/786

Abstract:
Topological insulators, such as single-crystal Bi2Se3 nanowires, can be used as the conduction channel in high-performance transistors, a basic circuit building block. Such transistors exhibit current-voltage characteristics superior to semiconductor nanowire transistors, including sharp turn-on, nearly zero cutoff current, very large On/Off current ratio, and well-saturated output current. The metallic electron transport at the surface with good effective mobility can be effectively separated from the conduction of the bulk topological insulator and adjusted by field effect at a small gate voltage. Topological insulators, such as Bi2Se3, also have a magneto-electric effect that causes transistor threshold voltage shifts with external magnetic field. These properties are desirable for numerous microelectronic and nanoelectronic circuitry applications, among other applications.
Public/Granted literature
- US20150333163A1 HIGH PERFORMANCE TOPOLOGICAL INSULATOR TRANSISTORS Public/Granted day:2015-11-19
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