Invention Grant
- Patent Title: Systems and methods for particulate removal using polymeric microstructures
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Application No.: US15772274Application Date: 2016-10-28
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Publication No.: US11001785B2Publication Date: 2021-05-11
- Inventor: Hadi Izadi , T Kyle Vanderlick
- Applicant: Yale University
- Applicant Address: US CT New Haven
- Assignee: Yale University
- Current Assignee: Yale University
- Current Assignee Address: US CT New Haven
- Agency: McCarter & English, LLP
- International Application: PCT/US2016/059344 WO 20161028
- International Announcement: WO2017/075365 WO 20170504
- Main IPC: C11D3/37
- IPC: C11D3/37 ; B08B7/00 ; H01L21/02 ; H01L21/67 ; B23B5/00 ; B08B1/00 ; C11D11/00 ; C11D3/48 ; C08K5/54 ; C08L83/14

Abstract:
Systems and methods for removing particles from a surface of a substrate without damage to the substrate are provided. The disclosed systems/methods use polymeric microstructures, e.g., microfibrils, to remove micrometric and sub-micrometric particles from a substrate surface by establishing interfacial interactions with the particles that effectively debond the particles from the surface of the substrate. The disclosed systems/methods have wide ranging applications, including particle removal in art conservation processes, microelectronic applications, optical applications and any other field that stands to benefit from precise removal of particles/dust from a surface without damage to the surface.
Public/Granted literature
- US20180312784A1 Systems and Methods for Particulate Removal Using Polymeric Microstructures Public/Granted day:2018-11-01
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