Invention Grant
- Patent Title: Photodetector element
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Application No.: US16353112Application Date: 2019-03-14
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Publication No.: US11004999B2Publication Date: 2021-05-11
- Inventor: Wei Dong , Hiroyasu Fujiwara
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: JPJP2018-054475 20180322
- Main IPC: H01L31/108
- IPC: H01L31/108 ; B82Y40/00

Abstract:
A photodetector element according to an aspect of the present disclosure includes a semiconductor layer with an uneven structure on one surface side that is constituted of projection portions and recess portions, and converts light into surface plasmons, and a metal film that is provided on the one surface side of the semiconductor layer in a manner corresponding to the uneven structure and a Schottky junction is formed between the metal film and the semiconductor layer. The semiconductor layer is constituted of n-type conductive silicon, and the other surface side of the semiconductor layer serves as an incident surface for light. The metal film is constituted of a material including nickel which form the Schottky junction when combined with the semiconductor layer.
Public/Granted literature
- US20190296176A1 PHOTODETECTOR ELEMENT Public/Granted day:2019-09-26
Information query
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