Invention Grant
- Patent Title: Method for wavefront measurement of optical imaging system based on grating shearing interferometry
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Application No.: US16684990Application Date: 2019-11-15
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Publication No.: US11009336B2Publication Date: 2021-05-18
- Inventor: Yunjun Lu , Feng Tang , Xiangzhao Wang
- Applicant: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Applicant Address: CN Shanghai
- Assignee: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Current Assignee: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Current Assignee Address: CN Shanghai
- Agency: Mei & Mark LLP
- Agent Manni Li
- Priority: CN201910183243.6 20190312
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G01J9/02 ; G01M11/02

Abstract:
A method for wavefront measurement of optical imaging system based on grating shearing interferometry, the grating shearing interferometer comprising: a light source and illumination system, an optical imaging system to be tested, a one-dimensional diffraction grating plate, a two-dimensional diffraction grating plate, a two-dimensional photoelectric sensor and a computing unit. The one-dimensional diffraction grating plate and the two-dimensional diffraction grating plate are respectively placed on the object side and the image side of the optical imaging system to be tested. By collecting N sets of interferograms with a 2 π N phase-shifting interval (where, N = 2 ( fix ( ceil ( 1 / s ) 2 ) + 1 ) , s is the shear ratio of the grating shearing interferometer), combined with a certain phase retrieval algorithm, the influence of all high-order diffraction beams on the phase retrieval accuracy is eliminated, and finally the wavefront measurement accuracy for the optical imaging system is improved.
Public/Granted literature
- US20200292296A1 METHOD FOR WAVEFRONT MEASUREMENT OF OPTICAL IMAGING SYSTEM BASED ON GRATING SHEARING INTERFEROMETRY Public/Granted day:2020-09-17
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