Invention Grant
- Patent Title: Pattern formation method and method for manufacturing polarizing plate
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Application No.: US16961563Application Date: 2019-01-11
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Publication No.: US11009789B2Publication Date: 2021-05-18
- Inventor: Kazuyuki Shibuya , Shigeshi Sakakibara , Toshiaki Sugawara , Yusuke Matsuno , Akio Takada
- Applicant: Dexerials Corporation
- Applicant Address: JP Tokyo
- Assignee: Dexerials Corporation
- Current Assignee: Dexerials Corporation
- Current Assignee Address: JP Tokyo
- Agency: Osha Bergman Watanabe & Burton LLP
- Priority: JPJP2018-003235 20180112
- International Application: PCT/JP2019/000661 WO 20190111
- International Announcement: WO2019/139116 WO 20190718
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F1/38 ; G02B5/30 ; H01L21/027 ; H01L21/033 ; H01L21/308 ; H01L21/311

Abstract:
Provided are a pattern formation method and a method for manufacturing a polarizing plate using the pattern formation method, the pattern formation method having: a step for forming, on a substrate, a linear guide pattern which is arranged at a predetermined pitch and is compatible with a portion of block chains of a block copolymer, and a neutral pattern embedded in the pattern of the guide pattern; a step for forming a layer including a block copolymer on the guide pattern and the neutral pattern; a step for heat-treating the layer including the block copolymer and forming a lamellar structure in which lamellar boundaries are arranged perpendicular to the substrate by microphase separation of the block copolymer; and a step for selectively removing a portion of the block chains of the block copolymer and thereby forming a line-and-space-shaped fine pattern having a smaller pitch than the guide pattern.
Public/Granted literature
- US20210011374A1 PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING POLARIZING PLATE Public/Granted day:2021-01-14
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