Invention Grant
- Patent Title: Method for simulating characteristics of semiconductor device
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Application No.: US15949268Application Date: 2018-04-10
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Publication No.: US11010524B2Publication Date: 2021-05-18
- Inventor: Mincheol Shin , Woo Jin Jeong , Jaehyun Lee
- Applicant: Korea Advanced Institute of Science and Technology
- Applicant Address: KR Daejeon
- Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee Address: KR Daejeon
- Agency: Daly, Crowley Mofford & Durkee, LLP
- Priority: KR10-2017-0046768 20170411
- Main IPC: G06F30/367
- IPC: G06F30/367 ; G06F119/06

Abstract:
Disclosed is a method for simulating characteristics of a semiconductor device. An overlap matrix and a Hamiltonian representing atomic interaction energy information of a target semiconductor device are extracted by using a density functional theory (DFT), and Bloch states for corresponding energies are calculated based on the Hamiltonian, the overlap matrix, and energy-k relation within an effective energy region. A first reduced Hamiltonian and a first reduced overlap matrix having a reduced matrix size are obtained by applying the Hamiltonian and the overlap matrix to a transformation matrix that is obtained by orthonormalizing a matrix representing the Bloch states. A final transformation matrix and a final energy band structure where all unphysical branches, which are energy bands not corresponding to a first energy band structure in a second energy band structure, are removed within the effective energy region are calculated.
Public/Granted literature
- US20180293342A1 METHOD FOR SIMULATING CHARACTERISTICS OF SEMICONDUCTOR DEVICE Public/Granted day:2018-10-11
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