Invention Grant
- Patent Title: Asymmetric gate edge spacing for SRAM structures
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Application No.: US16406121Application Date: 2019-05-08
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Publication No.: US11011528B2Publication Date: 2021-05-18
- Inventor: Alexander Reznicek , Ruilong Xie , Chun-Chen Yeh , Chen Zhang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent David K. Mattheis; William H. Hartwell; Nicholas L. Cadmus
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L27/02 ; H01L29/423 ; H01L21/762 ; H01L29/66 ; H01L21/3213 ; H01L27/092

Abstract:
An integrated circuit having logic and static random-access memory (SRAM) devices includes at least three active regions with gate terminals. Dielectric pillars are disposed between the active regions of the integrated circuit. A pillar is disposed symmetrically between two active regions of the logic device. A pillar is disposed asymmetrically between a p-channel field effect transistor (pFET), and an n-channel field effect transistor (nFET) of the SRAM device.
Information query
IPC分类: