Invention Grant
- Patent Title: Group 13 element nitride layer, free-standing substrate and functional element
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Application No.: US16797581Application Date: 2020-02-21
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Publication No.: US11011678B2Publication Date: 2021-05-18
- Inventor: Takayuki Hirao , Hirokazu Nakanishi , Mikiya Ichimura , Takanao Shimodaira , Masahiro Sakai , Takashi Yoshino
- Applicant: NGK INSULATORS, LTD.
- Applicant Address: JP Nagoya
- Assignee: NGK INSULATORS, LTD.
- Current Assignee: NGK INSULATORS, LTD.
- Current Assignee Address: JP Nagoya
- Agency: Flynn Thiel, P.C.
- Priority: WOPCT/JP2017/030373 20170824
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/32 ; C01B21/06 ; C09K11/08 ; C09K11/62 ; C09K11/64 ; C30B29/40 ; C30B29/38 ; G09G3/3208 ; H01L33/18

Abstract:
A layer of a crystal of a group 13 nitride selected from gallium nitride, aluminum nitride, indium nitride and the mixed crystals thereof has an upper surface and a bottom surface. The upper surface of the crystal layer of the group 13 nitride includes a linear high-luminance light-emitting part and a low-luminance light-emitting region adjacent to the high-luminance light-emitting part, observed by cathode luminescence. The high-luminance light-emitting part includes a portion extending along an m-plane of the crystal of the group 13 nitride.
Information query
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