Invention Grant
- Patent Title: Method for forming circuit board stacked structure
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Application No.: US16203636Application Date: 2018-11-29
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Publication No.: US11013103B2Publication Date: 2021-05-18
- Inventor: Ra-Min Tain , Kai-Ming Yang , Chien-Tsai Li
- Applicant: Unimicron Technology Corp.
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: CKC & Partners Co., LLC
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K1/11 ; H05K3/46

Abstract:
A method for forming a circuit board includes forming a first dielectric layer, a first circuit layer in the first dielectric layer, a second circuit layer on the first dielectric layer, and a plurality of conductive vias in the first dielectric layer and connecting the first circuit layer to the second circuit layer; forming a second dielectric layer on the first dielectric layer and the second circuit layer; forming a plurality of openings in the second dielectric layer to expose a plurality of parts of the second circuit layer; forming a seed layer on the exposed parts of the second circuit layer and sidewalls of the openings; and forming a plurality of bonding layers on the seed layer, wherein the bonding layers and the seed layer are made of copper, and the bonding layers are porous.
Public/Granted literature
- US20190098746A1 METHOD FOR FORMING CIRCUIT BOARD STACKED STRUCTURE Public/Granted day:2019-03-28
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