Invention Grant
- Patent Title: Array substrate and method of fabricating same
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Application No.: US16622088Application Date: 2019-09-30
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Publication No.: US11018213B2Publication Date: 2021-05-25
- Inventor: Cheng Chen
- Applicant: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Applicant Address: CN Hubei
- Assignee: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Current Assignee: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Current Assignee Address: CN Hubei
- Priority: CN201910752501.8 20190815
- International Application: PCT/CN2019/109486 WO 20190930
- International Announcement: WO2021/027040 WO 20210218
- Main IPC: H01L27/32
- IPC: H01L27/32 ; H01L51/00 ; H01L51/56

Abstract:
An array substrate and a method of fabricating the same are described. The array substrate has an active area and a winding area, wherein the array substrate has a base substrate, an active layer, a first insulating layer, a first metal layer, a second insulating layer, a second metal layer, a third insulating layer, a third metal layer, a flat layer, a patterned inorganic layer, and a pixel defining layer. The first metal layer has at least one first wiring pattern. The second metal layer has at least one second wiring pattern. The third metal layer has at least one third wiring pattern. The patterned inorganic layer is disposed on the flat layer within the winding area and has an undercut structure. The array substrate and the method of fabricating the same can reduce a width of a boundary formed by the winding area.
Public/Granted literature
- US20210050402A1 ARRAY SUBSTRATE AND METHOD OF FABRICATING SAME Public/Granted day:2021-02-18
Information query
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