Invention Grant
- Patent Title: Projection system
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Application No.: US16578495Application Date: 2019-09-23
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Publication No.: US11022872B2Publication Date: 2021-06-01
- Inventor: Chen-Cheng Huang
- Applicant: BENQ CORPORATION , BenQ Intelligent Technology (Shanghai) Co., Ltd
- Applicant Address: TW Taipei; CN Shanghai
- Assignee: BENQ CORPORATION,BenQ Intelligent Technology (Shanghai) Co., Ltd
- Current Assignee: BENQ CORPORATION,BenQ Intelligent Technology (Shanghai) Co., Ltd
- Current Assignee Address: TW Taipei; CN Shanghai
- Priority: CN201811127220.5 20180927
- Main IPC: G03B21/20
- IPC: G03B21/20 ; G03B21/00

Abstract:
A projection system includes a light source, a projection lens, and a light-adjusting diaphragm element. The light source emits a first light having a first dominant wavelength range and a second dominant wavelength range. The projection lens is disposed on the path of the first light. The light-adjusting diaphragm element, disposed between the light source and the projection lens, has an opening and a light shielding area outside the opening, a filter is disposed in the opening, wherein a part of the first light is blocked by the light shielding area, a wavelength band corresponding to the first dominant wavelength range of other part of the first light passes through the opening, and a wavelength band corresponding to the second dominant wavelength range of the other part of the first light is blocked by the filter to become a second light having a narrow wavelength range.
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