Invention Grant
- Patent Title: Lithographic apparatus adjustment method
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Application No.: US16644135Application Date: 2018-08-14
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Publication No.: US11022895B2Publication Date: 2021-06-01
- Inventor: Pierluigi Frisco , Giovanni Imponente , James Robert Downes
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP17189220 20170904
- International Application: PCT/EP2018/071981 WO 20180814
- International Announcement: WO2019/042757 WO 20190307
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20
Abstract:
A method comprising determining aberrations caused by each lithographic apparatus of a set of lithographic apparatuses, calculating adjustments of the lithographic apparatuses which minimize differences between the aberrations caused by each of the lithographic apparatuses, and applying the adjustments to the lithographic apparatuses, providing better matching between the aberrations of patterns projected by the lithographic apparatuses.
Public/Granted literature
- US20200272059A1 Lithographic Apparatus Adjustment Method Public/Granted day:2020-08-27
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