Invention Grant
- Patent Title: Nonvolatile memory cell and nonvolatile memory device comprising the same
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Application No.: US16876553Application Date: 2020-05-18
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Publication No.: US11024357B1Publication Date: 2021-06-01
- Inventor: Soichiro Mizusaki , Jungho Yoon , Youngjin Cho
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2019-0170072 20191218
- Main IPC: G11C11/22
- IPC: G11C11/22 ; H01L29/78 ; H01L29/51

Abstract:
A nonvolatile memory cell resistance change type nonvolatile memory cell configured to store information by changing an electrical resistance according to application of electrical stress is provided and a nonvolatile memory device including the nonvolatile memory cell is provided. The resistance change type nonvolatile memory cell includes a resistance change material layer including a resistance change material; a ferroelectric layer on a first side of the resistance change material layer, the ferroelectric layer configured to change an electrical resistance of the resistance change material layer according to a polarization direction and polarization size of a ferroelectric therein; a first electrode on the ferroelectric layer and configured to control the polarization direction and the polarization size of the ferroelectric based on an applied voltage; and a second electrode and a third electrode on the resistance change material layer with the first electrode therebetween.
Public/Granted literature
- US20210193207A1 NONVOLATILE MEMORY CELL AND NONVOLATILE MEMORY DEVICE COMPRISING THE SAME Public/Granted day:2021-06-24
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