- Patent Title: Methods and systems for highly optimized memristor write process
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Application No.: US16667773Application Date: 2019-10-29
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Publication No.: US11024379B2Publication Date: 2021-06-01
- Inventor: Amit Sharma , John Paul Strachan , Suhas Kumar , Catherine Graves , Martin Foltin , Craig Warner
- Applicant: Hewlett Packard Enterprise Development LP
- Applicant Address: US TX Houston
- Assignee: Hewlett Packard Enterprise Development LP
- Current Assignee: Hewlett Packard Enterprise Development LP
- Current Assignee Address: US TX Houston
- Agency: Sheppard Mullin Richter & Hampton LLP
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C13/00

Abstract:
Systems and methods for providing write process optimization for memristors are described. Write process optimization circuitry manipulates the memristor's write operation, allowing the number of cycles in the write process is reduced. Write process optimization circuitry can include write current integration circuitry that measures an integral of a write current over time. The write optimization circuitry can also include shaping circuitry. The shaping circuitry can shape a write pulse, by determining the pulse's termination, width, and slope. The write pulse is shaped depending upon whether the target memristor device exhibits characteristics of “maladroit” cells or “adroit” cells. The pulse shaping circuitry uses the integral and measured write current to terminate the write pulse in a manner that allows the memristor, wherein having maladroit cells and adroit cells, to reach a target state. Thus, utility of memristors is enhanced by realizing an optimized write process with decrease latency and improved efficiency.
Public/Granted literature
- US20210125667A1 METHODS AND SYSTEMS FOR HIGHLY OPTIMIZED MEMRISTOR WRITE PROCESS Public/Granted day:2021-04-29
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