Invention Grant
- Patent Title: Semiconductor device with spacer over sidewall of bonding pad and method for preparing the same
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Application No.: US16656823Application Date: 2019-10-18
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Publication No.: US11024592B2Publication Date: 2021-06-01
- Inventor: Tse-Yao Huang
- Applicant: NANYA TECHNOLOGY CORPORATION
- Applicant Address: TW New Taipei
- Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee Address: TW New Taipei
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
The present application provides a semiconductor device and a method for preparing the semiconductor device. The semiconductor device includes a bonding pad disposed over a semiconductor substrate, and a first spacer disposed over a sidewall of the bonding pad. The semiconductor device also includes a first passivation layer covering the bonding pad and the first spacer, and a conductive bump disposed over the first passivation layer. The conductive bump is electrically connected to a source/drain region in the semiconductor substrate through the bonding pad.
Public/Granted literature
- US20210118830A1 SEMICONDUCTOR DEVICE WITH SPACER OVER SIDEWALL OF BONDING PAD AND METHOD FOR PREPARING THE SAME Public/Granted day:2021-04-22
Information query
IPC分类: