Invention Grant
- Patent Title: Transistor, array substrate and method of manufacturing the same, display device
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Application No.: US16318740Application Date: 2018-04-02
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Publication No.: US11024657B2Publication Date: 2021-06-01
- Inventor: Zhengliang Li , Ce Ning , Song Liu , Wenlin Zhang , Xuefei Sun
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: The Webb Law Firm
- Priority: CN201710710353.4 20170818
- International Application: PCT/CN2018/081572 WO 20180402
- International Announcement: WO2019/033762 WO 20190221
- Main IPC: H01L27/12
- IPC: H01L27/12
Abstract:
The present disclosure provides a transistor, an array substrate and a method of manufacturing the array substrate, and a display device. The method of manufacturing the array substrate comprises: depositing a plurality of silicon oxide layers on an active layer of a transistor; and depositing a silicon oxynitride layer over the plurality of silicon oxide layers.
Public/Granted literature
- US20200286929A1 TRANSISTOR, ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, DISPLAY DEVICE Public/Granted day:2020-09-10
Information query
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