Invention Grant
- Patent Title: Ink jet method and ink jet apparatus
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Application No.: US16784600Application Date: 2020-02-07
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Publication No.: US11027544B2Publication Date: 2021-06-08
- Inventor: Keitaro Nakano , Kyohei Tanaka , Midori Sekine , Chigusa Sato
- Applicant: Seiko Epson Corporation
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JPJP2019-021456 20190208
- Main IPC: B41J2/13
- IPC: B41J2/13 ; B41J2/135 ; C09D11/30 ; B41J2/435

Abstract:
An ink jet method includes: a discharging step of discharging a radiation-curable ink jet composition onto a recording medium at an ink weight per dot of 22 ng/dot or less by using an ink jet head configured to discharge the radiation-curable ink jet composition and having a nozzle density of 600 npi or more; and an irradiating step of irradiating, with radiation, the radiation-curable ink jet composition attached to the recording medium. The radiation-curable ink jet composition contains polymerizable compounds including a monofunctional monomer and a multifunctional monomer. The monofunctional monomer includes a nitrogen-containing monofunctional monomer. The amount of the monofunctional monomer is 90 mass % or more relative to the total amount of the polymerizable compounds. The amount of the nitrogen-containing monofunctional monomer is from 1 to 15 mass % relative to the total amount of the polymerizable compounds.
Public/Granted literature
- US20200254755A1 Ink Jet Method And Ink Jet Apparatus Public/Granted day:2020-08-13
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