- Patent Title: Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrate
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Application No.: US16491349Application Date: 2018-02-19
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Publication No.: US11028340B2Publication Date: 2021-06-08
- Inventor: Yasuto Ishida , Tsutomu Yoshino , Shogo Onishi , Yukinobu Yoshizaki
- Applicant: FUJIMI INCORPORATED
- Applicant Address: JP Kiyosu
- Assignee: FUJIMI INCORPORATED
- Current Assignee: FUJIMI INCORPORATED
- Current Assignee Address: JP Kiyosu
- Agency: Foley & Lardner LLP
- Priority: JPJP2017-042112 20170306,JPJP2017-185150 20170926
- International Application: PCT/JP2018/005779 WO 20180219
- International Announcement: WO2018/163781 WO 20180913
- Main IPC: C11D3/37
- IPC: C11D3/37 ; C11D1/00 ; C09G1/04 ; C11D11/00 ; C11D17/00 ; H01L21/02 ; H01L21/306
Abstract:
An objective of the present invention is to provide a means for sufficiently removing residues remaining on a surface of a polished object to be polished.
A composition for surface treatment containing a polymer compound having at least one ionic functional group selected from the group consisting of a sulfonic acid (salt) group, a phosphoric acid (salt) group, a phosphoric acid (salt) group, and an amino group, and water, in which pH is less than 7, and the polymer compound has a pKa of 3 or less and an ionic functional group density of more than 10%.
A composition for surface treatment containing a polymer compound having at least one ionic functional group selected from the group consisting of a sulfonic acid (salt) group, a phosphoric acid (salt) group, a phosphoric acid (salt) group, and an amino group, and water, in which pH is less than 7, and the polymer compound has a pKa of 3 or less and an ionic functional group density of more than 10%.
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