The present disclosure relates to the technical field of chemical vapor deposition coating equipment, and discloses a method for preventing vacuum pump pipeline from blockage, which includes the following steps: opening a gas source, and introducing reaction gas into a process chamber from the gas source; carrying out a coating reaction of a chemical vapor deposition machine in the process chamber; after coating, closing the gas source, and introducing heated inert gas into an air exhaust pipe connected to an outlet of a vacuum pump; turning on the vacuum pump, and introducing dust and exhaust gas in the process chamber into a exhaust gas treatment device through the air exhaust pipe. The present disclosure also provides a chemical vapor deposition machine applying the method for preventing the vacuum pump pipeline from blockage.