Invention Grant
- Patent Title: Method and a system for XRF marking and reading XRF marks of electronic systems
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Application No.: US16834732Application Date: 2020-03-30
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Publication No.: US11029267B2Publication Date: 2021-06-08
- Inventor: Nataly Tal , Mor Kaplinsky , Tehila Nahum , Hagit Sade , Dana Gasper , Ron Dafni , Chen Nachmias , Michal Firstenberg , Avital Trachtman , Haggai Alon , Nadav Yoran , Tzemah Kislev
- Applicant: SECURITY MATTERS LTD.
- Applicant Address: IL D.N. Hevel Eilot
- Assignee: SECURITY MATTERS LTD.
- Current Assignee: SECURITY MATTERS LTD.
- Current Assignee Address: IL D.N. Hevel Eilot
- Agency: Browdy and Neimark, PLLC
- Main IPC: G01N23/223
- IPC: G01N23/223 ; C23C16/48
Abstract:
There are disclosed a method of producing an XRF readable mark, the XRF readable mark and a component comprising thereof. The method comprises providing an XRF marking composition with specific relative concentrations of one or more chemical elements and fabricating a multilayer structure of the XRF readable mark. The relative concentrations are selected such that in response to irradiation of the XRF marking composition by XRF exciting radiation, the XRF marking composition emits an XRF signal indicative of a predetermined XRF signature. Fabricating the multilayer structure comprises implementing an attenuation layer with at least one element exhibiting high absorbance for an XRF exciting radiation and/or an XRF background; and implementing a marking layer comprising said XRF marking composition.
Public/Granted literature
- US20200225174A1 METHOD AND A SYSTEM FOR XRF MARKING AND READING XRF MARKS OF ELECTRONIC SYSTEMS Public/Granted day:2020-07-16
Information query
