Invention Grant
- Patent Title: Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
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Application No.: US15776759Application Date: 2017-01-31
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Publication No.: US11029596B2Publication Date: 2021-06-08
- Inventor: Ji Young Hwang , Han Min Seo , Nam Seok Bae , Seung Heon Lee , Dong Hyun Oh , Jungsun You
- Applicant: LG CHEM, LTD.
- Applicant Address: KR Seoul
- Assignee: LG CHEM, LTD.
- Current Assignee: LG CHEM, LTD.
- Current Assignee Address: KR Seoul
- Agency: Dentons US LLP
- Priority: KR10-2016-0010240 20160127
- International Application: PCT/KR2017/001031 WO 20170131
- International Announcement: WO2017/131498 WO 20170803
- Main IPC: G03F1/48
- IPC: G03F1/48 ; G03F1/76 ; G03F1/38 ; G03F7/00 ; G03F7/20 ; G03F7/30 ; H01L21/033
Abstract:
The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and an embossed pattern part provided on a surface of the transparent substrate, which is provided with the darkened light-shielding pattern layer, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern formed by using the same.
Public/Granted literature
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