Invention Grant
- Patent Title: Method for producing pattern laminate, method for producing reversal pattern, and pattern laminate
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Application No.: US16112003Application Date: 2018-08-24
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Publication No.: US11029597B2Publication Date: 2021-06-08
- Inventor: Yuichiro Goto , Kazuhiro Marumo
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPJP2016-037880 20160229
- Main IPC: G03F7/00
- IPC: G03F7/00 ; H01L21/308 ; H01L21/311 ; B81C1/00 ; G03F7/027 ; H01L21/027 ; B82Y40/00 ; G03F7/075
Abstract:
Provided are a method for producing a pattern laminate, the pattern laminate having a first layer having a pattern on an object to be processed and a second layer, which has a small waviness after etching (ΔLWR), in which the method includes a step of forming a first layer having a pattern on an object to be processed and a step of forming a second layer on the first layer, and the glass transition temperature of the first layer is 90° C. or higher; a method for producing a reversal pattern; and a pattern laminate.
Public/Granted literature
- US20180364566A1 METHOD FOR PRODUCING PATTERN LAMINATE, METHOD FOR PRODUCING REVERSAL PATTERN, AND PATTERN LAMINATE Public/Granted day:2018-12-20
Information query
