Invention Grant
- Patent Title: Optical element for the beam guidance of imaging light in projection lithography
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Application No.: US16735883Application Date: 2020-01-07
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Publication No.: US11029606B2Publication Date: 2021-06-08
- Inventor: Jens Prochnau , Dirk Schaffer , Roman Orlik
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102017212869.0 20170726,DE102018200152.9 20180108
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B7/182

Abstract:
An optical element is configured to guide imaging light in projection lithography. The optical element has a main body and at least one optical surface carried by the main body. At least one compensation weight element, which is attached to the main body, serves for a weight compensation of a figure deformation of the optical surface caused by gravity. This results in an optical element with a small figure deformation at the use location.
Public/Granted literature
- US20200150544A1 OPTICAL ELEMENT FOR THE BEAM GUIDANCE OF IMAGING LIGHT IN PROJECTION LITHOGRAPHY Public/Granted day:2020-05-14
Information query
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