Invention Grant
- Patent Title: Routing design of dummy metal cap and redistribution line
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Application No.: US16511777Application Date: 2019-07-15
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Publication No.: US11031352B2Publication Date: 2021-06-08
- Inventor: Chen-Hua Yu , Hsien-Wei Chen , Meng-Tsan Lee , Tsung-Shu Lin , Wei-Cheng Wu , Chien-Chia Chiu , Chin-Te Wang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L23/00 ; H01L23/538 ; H01L23/31 ; H01L21/56 ; H01L25/10 ; H01L25/00 ; H01L23/498 ; H01L21/683

Abstract:
A package includes a first dielectric layer, a device die over and attached to the first dielectric layer, an active through-via and a dummy through-via, and an encapsulating material encapsulating the device die, the active through-via, and the dummy through-via. The package further includes a second dielectric layer over and contacting the device die, the active through-via, and the dummy through-via. An active metal cap is over and contacting the second dielectric layer and electrically coupling to the active through-via. The active metal cap overlaps the active through-via. A dummy metal cap is over and contacting the second dielectric layer. The dummy metal cap overlaps the dummy through-via. The dummy metal cap is separated into a first portion and a second portion by a gap. A redistribution line passes through the gap between the first portion and the second portion of the dummy metal cap.
Public/Granted literature
- US20190341360A1 Routing Design of Dummy Metal Cap and Redistribution Line Public/Granted day:2019-11-07
Information query
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