Invention Grant
- Patent Title: Refill and replacement method for droplet generator
-
Application No.: US16548731Application Date: 2019-08-22
-
Publication No.: US11032897B2Publication Date: 2021-06-08
- Inventor: Shih-Yu Tu , Han-Lung Chang , Hsiao-Lun Chang , Li-Jui Chen , Po-Chung Cheng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
A method includes ejecting a metal droplet from a reservoir of a droplet generator toward a zone of excitation in front of a collector, emitting an excitation laser toward the zone of excitation, such that the metal droplet is heated by the excitation laser to generate extreme ultraviolet (EUV) radiation, halting the emission of the excitation laser, depressurizing the reservoir of the droplet generator, cooling down the droplet generator to a temperature not lower than about 150° C., and refilling the reservoir of the droplet generator with a solid metal material at the temperature not lower than about 150° C.
Public/Granted literature
- US20210059036A1 REFILL AND REPLACEMENT METHOD FOR DROPLET GENERATOR Public/Granted day:2021-02-25
Information query