Invention Grant
- Patent Title: Method of, and apparatus for, reducing photoelectron yield and/or secondary electron yield
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Application No.: US15739062Application Date: 2016-06-24
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Publication No.: US11033985B2Publication Date: 2021-06-15
- Inventor: Amin Abdolvand
- Applicant: University of Dundee
- Applicant Address: GB Dundee
- Assignee: University of Dundee
- Current Assignee: University of Dundee
- Current Assignee Address: GB Dundee
- Agency: Myers Bigel, P.A.
- Priority: GB1511153 20150624,GB1511154 20150624,GB1517232 20150930,GB1517235 20150930,GB1603991 20160308
- International Application: PCT/GB2016/051909 WO 20160624
- International Announcement: WO2016/207660 WO 20161229
- Main IPC: B23K26/00
- IPC: B23K26/00 ; B23K26/0622 ; B23K26/082 ; B23K26/352 ; B23K103/04 ; B23K103/06 ; B23K103/10 ; B23K103/12 ; B23K103/14
Abstract:
A method of reducing photoelectron yield (PEY) and/or secondary electron yield (SEY) of a surface of a target (10), comprises applying laser radiation to the surface of the target (10) to produce a periodic arrangement of structures on the surface, wherein the laser radiation comprises pulsed laser radiation comprising a series of laser pulses and the power density of the pulses is in a range 0.01 TW/cm2 to 3 TW/cm2, optionally 0.1 TW/cm2 to 3 TW/cm2.
Public/Granted literature
- US20180178319A1 METHOD OF, AND APPARATUS FOR, REDUCING PHOTOELECTRON YIELD AND/OR SECONDARY ELECTRON YIELD Public/Granted day:2018-06-28
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