Invention Grant
- Patent Title: Method and system for fabricating cross-layer pattern
-
Application No.: US15128975Application Date: 2015-03-25
-
Publication No.: US11034081B2Publication Date: 2021-06-15
- Inventor: Daniel Dikovsky , Ira Yudovin-Farber , Efraim Dvash
- Applicant: Stratasys Ltd.
- Applicant Address: IL Rehovot
- Assignee: Stratasys Ltd.
- Current Assignee: Stratasys Ltd.
- Current Assignee Address: IL Rehovot
- International Application: PCT/IL2015/050316 WO 20150325
- International Announcement: WO2015/145439 WO 20151001
- Main IPC: B29C64/112
- IPC: B29C64/112 ; C09D11/52 ; H05K3/12 ; H05K3/46 ; B33Y10/00 ; C09D11/30 ; B33Y50/02 ; B33Y70/00 ; C09D133/14 ; C09D133/26 ; H05K1/18 ; H05K3/30 ; H05K1/09 ; B29K105/00

Abstract:
A method of fabricating a cross-layer pattern in a layered object is disclosed. The method is executed by an additive manufacturing system and comprises: dispensing a patterning material onto a receiving medium to form a first pattern element; dispensing a first layer of modeling material onto the first pattern element while forming a first open cavity exposing at least a portion of the first pattern element beneath the first layer; and dispensing patterning material onto the exposed portion of the first pattern element and the first layer to form a second pattern element contacting the first pattern element.
Public/Granted literature
- US11090858B2 Method and system for fabricating cross-layer pattern Public/Granted day:2021-08-17
Information query
IPC分类: