Invention Grant
- Patent Title: Showerhead and substrate processing apparatus
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Application No.: US16178023Application Date: 2018-11-01
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Publication No.: US11035040B2Publication Date: 2021-06-15
- Inventor: Edward Sung , Jin Young Bang , Hyuk Kim , Sung Il Cho
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A.
- Priority: KR10-2018-0046148 20180420
- Main IPC: C23C16/455
- IPC: C23C16/455 ; H01J37/32 ; C23C16/44

Abstract:
A showerhead according to an embodiment of the present inventive concept includes an upper plate including a plurality of gas supply passages, a lower plate including a plurality of supply holes and a plurality of exhaust slots formed in a lower surface, and a plurality of partition walls between the upper plate and the lower plate, connected to a plurality of exhaust slots and defining exhaust passages that are open at a side portion of the showerhead.
Public/Granted literature
- US20190323126A1 SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUS Public/Granted day:2019-10-24
Information query
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