- Patent Title: Atomic force microscopy system, method for mapping one or more subsurface structures located in a semiconductor device or for monitoring lithographic parameters in a semiconductor device and use of such an atomic force microscopy system
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Application No.: US16769951Application Date: 2018-12-04
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Publication No.: US11035878B2Publication Date: 2021-06-15
- Inventor: Laurent Fillinger , Paul Louis Maria Joseph Van Neer , Daniele Piras , Marcus Johannes Van Der Lans , Maarten Hubertus Van Es , Hamed Sadeghian Marnani
- Applicant: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Applicant Address: NL s-Gravenhage
- Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Current Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Current Assignee Address: NL s-Gravenhage
- Agency: Banner & Witcoff, Ltd.
- Priority: EP17205415 20171205
- International Application: PCT/NL2018/050808 WO 20181204
- International Announcement: WO2019/112424 WO 20190613
- Main IPC: G01Q60/24
- IPC: G01Q60/24 ; G01Q70/06 ; G01N29/06

Abstract:
Atomic force microscopy system comprising an atomic force microscopy device and a substrate carrier having a carrier surface carrying a substrate. The substrate has a substrate main surface and a substrate scanning surface opposite the substrate main surface. The atomic force microscopy device comprises a scan head including a probe. The probe comprises a cantilever and a probe tip arranged on the cantilever. The atomic force device further comprises an actuator cooperating with at least one of the scan head or the substrate carrier for moving the probe tip and the substrate carrier relative to each other in one or more directions parallel to the carrier surface for scanning of the substrate scanning surface with the probe tip. A signal application actuator applies, during said scanning, an acoustic input signal to the substrate, said acoustic input signal generating a first displacement field in a first displacement direction only. A tip position detector monitors motion of the probe tip relative to the scan head during said scanning for obtaining an output signal. The tip position detector is arranged for monitoring motion of the probe tip only in a direction orthogonal to the displacement direction.
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