Methods and systems for dispensing fluid in imprint lithography, including selecting drop patterns, each associated with different target locations on a substrate and a selected volume for each drop of each drop pattern; selecting a plurality of subsets of nozzles of a dispenser, each subset configured to dispense drops corresponding to each drop pattern; for each drop pattern: dispensing the drops corresponding to the drop pattern from each subset of nozzles; obtaining an image of the drops from each subset of nozzles; and processing the image from each subset of nozzles to determine a positional error of the drops with respect to the target locations and a volumetric error of the drops with respect to the selected volume for each drop; and adjusting, based on the positional error and the volumetric error of the drops from each subset of nozzles for each drop pattern, dispense parameters of the dispenser.