Invention Grant
- Patent Title: Method for producing R-T-B sintered magnet
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Application No.: US16481084Application Date: 2018-01-31
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Publication No.: US11037724B2Publication Date: 2021-06-15
- Inventor: Futoshi Kuniyoshi
- Applicant: HITACHI METALS, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI METALS, LTD.
- Current Assignee: HITACHI METALS, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Keating & Bennett, LLP
- Priority: JPJP2017-015394 20170131
- International Application: PCT/JP2018/003088 WO 20180131
- International Announcement: WO2018/143229 WO 20180809
- Main IPC: H01F41/02
- IPC: H01F41/02 ; H01F1/057

Abstract:
A method of producing a sintered R-T-B based magnet includes providing a sintered R-T-B based magnet work, an RH compound (at least one selected from RH fluorides, RH oxides, and RH oxyfluorides), and an RL-Ga alloy, where the sintered magnet work contains R: 27.5 to 35.0 mass %, B: 0.80 to 0.99 mass %, Ga: 0 to 0.8 mass %, M: 0 to 2 mass % (where M is at least one of Cu, Al, Nb and Zr), and T: 60 mass % or more; a diffusion step of, while keeping the RH compound and the RL-Ga alloy in contact with a surface of the sintered magnet work, performing a first heat treatment between 700° C. and 950° C. to increase the RH amount contained in the sintered magnet work by between 0.05 mass % and 0.40 mass %; and performing a second heat treatment between 450° C. and 750° C. but which is lower than the first heat treatment.
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