Invention Grant
- Patent Title: Method for making redistribution circuit structure
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Application No.: US16850216Application Date: 2020-04-16
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Publication No.: US11037803B2Publication Date: 2021-06-15
- Inventor: Yung-Fu Lin , Po-Liang Chen
- Applicant: Century Technology (Shenzhen) Corporation Limited
- Applicant Address: CN Shenzhen
- Assignee: Century Technology (Shenzhen) Corporation Limited
- Current Assignee: Century Technology (Shenzhen) Corporation Limited
- Current Assignee Address: CN Shenzhen
- Agency: ScienBiziP, P.C.
- Priority: CN201910353582.4 20190429
- Main IPC: H05K3/02
- IPC: H05K3/02 ; H05K3/10 ; H01L21/48 ; H01L21/027 ; H01L21/683 ; H01L23/498 ; H01L23/00

Abstract:
A method for making a redistribution circuit structure provides a substrate and forms a peelable layer on the substrate. A metal layer is formed on a surface of the peelable layer, the metal layer including a controlling circuit including at least two spaced units. A first photoresist layer is formed on a portion of the surface of the peelable layer and an insulating layer is applied to completely cover the first photoresist layer and the controlling circuit. Through holes are defined in the insulating layer to partially expose the controlling circuit and a seed layer applied on the insulating layer. A block layer is laid to divide the seed layer into multiple sections and electroplating in each section on a portion of the seed layer is applied to form a plating layer with better uniformity of thickness across all sections.
Public/Granted literature
- US20200343104A1 METHOD FOR MAKING REDISTRIBUTION CIRCUIT STRUCTURE Public/Granted day:2020-10-29
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