Invention Grant
- Patent Title: Transfer device and method for transferring substrate without unexpected rotation
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Application No.: US16513837Application Date: 2019-07-17
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Publication No.: US11037809B2Publication Date: 2021-06-15
- Inventor: Pei-Lun Hung , Chia-Wei Hsu , Chia-Hsiang Liao , Ming-Hung Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/683 ; H01L21/687 ; B25J11/00

Abstract:
A transfer device for transferring a substrate is provided, including a base plate, at least one suction unit disposed on a side of the base plate to generate suction on the substrate, and a plurality of movement restriction units disposed on the side of the base plate to limit the movement of the substrate during transfer. Each of the movement restriction units includes a main body, an abutting member, and a pusher. The main body is attached to the base plate and has a chamber therein. The abutting member is movably received in the chamber and has an abutting portion that protrudes beyond the main body to abut the substrate. The pusher is received in the chamber and configured to push the abutting member to move toward the substrate.
Public/Granted literature
- US20210020486A1 TRANSFER DEVICE AND METHOD FOR TRANSFERRING SUBSTRATE WITHOUT UNEXPECTED ROTATION Public/Granted day:2021-01-21
Information query
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