Invention Grant
- Patent Title: Waste fluid treatment apparatus
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Application No.: US16740695Application Date: 2020-01-13
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Publication No.: US11040889B2Publication Date: 2021-06-22
- Inventor: Shinichi Namioka
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer, Burns & Crain, Ltd.
- Priority: JPJP2019-004271 20190115
- Main IPC: C02F1/00
- IPC: C02F1/00 ; C02F103/34

Abstract:
A waste fluid treatment apparatus removing processing debris from a processing waste fluid discharged from a processing apparatus. The waste fluid treatment apparatus includes a fluid bath storing the processing waste fluid, an inflow port through which the processing waste fluid is introduced to the fluid bath, a collecting area having an inclined surface for depositing the processing debris at a predetermined portion of a bottom of the fluid bath in a concentrated manner, a vacuum pump discharging the processing debris deposited in the collecting area to an outside of the fluid bath, and an outflow port through which a processing waste fluid obtained by removing the processing debris is discharged.
Public/Granted literature
- US20200223713A1 WASTE FLUID TREATMENT APPARATUS Public/Granted day:2020-07-16
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