Invention Grant
- Patent Title: Production method for Fabry-Perot interference filter
-
Application No.: US16303688Application Date: 2017-05-26
-
Publication No.: US11041755B2Publication Date: 2021-06-22
- Inventor: Takashi Kasahara , Katsumi Shibayama , Masaki Hirose , Toshimitsu Kawai , Hiroki Oyama , Yumi Kuramoto
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: JPJP2016-106269 20160527,JP2016-163916 20160824,JP2016-163942 20160824
- International Application: PCT/JP2017/019680 WO 20170526
- International Announcement: WO2017/204326 WO 20171130
- Main IPC: G01J3/26
- IPC: G01J3/26 ; B23K26/53 ; B23K26/08 ; G02B5/28 ; G02B26/00

Abstract:
A method of manufacturing a Fabry-Perot interference filter includes a forming step of forming a first mirror layer having a plurality of first mirror portions, a sacrificial layer having a plurality of portions expected to be removed, and a second mirror layer having a plurality of second mirror portions on a first main surface of a wafer which includes parts corresponding to a plurality of two-dimensionally arranged substrates and is expected to be cut into the plurality of substrates along each of a plurality of lines; a removing step of simultaneously removing the plurality of two-dimensionally arranged portions expected to be removed from the sacrificial layer through etching after the Ruining step; and a cutting step of cutting the wafer into the plurality of substrates along each of the plurality of lines after the removing step.
Information query