Invention Grant
- Patent Title: Chemically amplified photoresist composition, photoresist pattern, and method for preparing photoresist pattern
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Application No.: US16488515Application Date: 2018-09-14
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Publication No.: US11042089B2Publication Date: 2021-06-22
- Inventor: Min Young Lim , Ji Hye Kim , Yongmi Kim
- Applicant: LG CHEM, LTD.
- Applicant Address: KR Seoul
- Assignee: LG CHEM, LTD.
- Current Assignee: LG CHEM, LTD.
- Current Assignee Address: KR Seoul
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: KR10-2017-0118879 20170915,KR10-2018-0109090 20180912
- International Application: PCT/KR2018/010869 WO 20180914
- International Announcement: WO2019/054805 WO 20190321
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20
Abstract:
The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin and a polymeric photo-acid generator having a predetermined structure, a photoresist pattern produced from the chemically amplified photoresist composition, and a method for preparing the chemically amplified photoresist pattern.
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