Invention Grant
- Patent Title: Dielectric based metasurface hologram device and manufacturing method of same and display device having same
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Application No.: US16351731Application Date: 2019-03-13
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Publication No.: US11042119B2Publication Date: 2021-06-22
- Inventor: Jun Suk Rho , In Ki Kim , Da Sol Lee
- Applicant: POSTECH Academy-Industry Foundation
- Applicant Address: KR Pohang-si
- Assignee: POSTECH Academy-Industry Foundation
- Current Assignee: POSTECH Academy-Industry Foundation
- Current Assignee Address: KR Pohang-si
- Agency: Lex IP Meister, PLLC
- Priority: KR10-2018-0033235 20180322
- Main IPC: G03H1/02
- IPC: G03H1/02 ; G03H1/22

Abstract:
A dielectric based metasurface hologram device includes: a substrate layer provided at a lowermost portion of the dielectric based metasurface hologram device; and a dielectric layer forming a geometric metasurface on the substrate layer. The substrate layer includes a plurality of unit cells which are continuous, and the dielectric layer includes a plurality of nano-structures which are disposed with a predetermined distance therebetween. The single nano-structure is disposed on the unit cell, and a hologram image is formed when an incident light from a light source is reflected by the nano-structure so that a phase of the light is controlled.
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