Invention Grant
- Patent Title: Semiconductor device having a dielectric dummy gate
-
Application No.: US16726005Application Date: 2019-12-23
-
Publication No.: US11043490B2Publication Date: 2021-06-22
- Inventor: Jhon-Jhy Liaw
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H01L27/08
- IPC: H01L27/08 ; H01L27/02 ; H01L29/06 ; H01L27/088 ; H01L29/66 ; H01L21/8234 ; H01L29/78 ; H01L27/108 ; H01L27/12 ; H01L27/092

Abstract:
A semiconductor device includes a dielectric dummy gate, a plurality of first semiconductor fins, and a plurality of second semiconductor fins. The dielectric dummy gate extends along a first direction. The first semiconductor fins extend along a second direction within a first core circuit region on a first side of the dielectric dummy gate, and the second direction is substantially perpendicular to the first direction. The second semiconductor fins extend along the second direction within a second core circuit region on a second side of the dielectric dummy gate opposite the first side of the dielectric dummy gate. A number of the second semiconductor fins within the second core circuit region is less than a number of the first semiconductor fins within the first core circuit region, and each of the second semiconductor fins has a width less than a width of each of the first semiconductor fins.
Information query
IPC分类: