Invention Grant
- Patent Title: Semiconductor structures in a wide gate pitch region of semiconductor devices
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Application No.: US16599116Application Date: 2019-10-10
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Publication No.: US11043566B2Publication Date: 2021-06-22
- Inventor: Jiehui Shu , Judson Robert Holt , Sipeng Gu , Haiting Wang
- Applicant: GLOBALFOUNDRIES U.S. INC.
- Applicant Address: US CA Santa Clara
- Assignee: GLOBALFOUNDRIES U.S. INC.
- Current Assignee: GLOBALFOUNDRIES U.S. INC.
- Current Assignee Address: US CA Santa Clara
- Agent David Cain
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L21/8234 ; H01L27/088 ; H01L29/417

Abstract:
A semiconductor device is provided that includes a substrate, an active region, a pair of gates, a plurality of semiconductor structures and a plurality of pillar structures. The active region is over the substrate. The pair of gates is formed over the active region, and each gate of the pair of gates includes a gate structure and a pair of spacer structures disposed on sidewalls of the gate structure. The plurality of semiconductor structures is arranged between the pair of gates in an alternating arrangement configuration having a first width and a second width. The first width is substantially equal to a width of the gate structure. The plurality of semiconductor structures is separated by the plurality of pillar structures.
Public/Granted literature
- US20210111261A1 SEMICONDUCTOR STRUCTURES IN A WIDE GATE PITCH REGION OF SEMICONDUCTOR DEVICES Public/Granted day:2021-04-15
Information query
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