Invention Grant
- Patent Title: Non-volatile memory cell and non-volatile memory
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Application No.: US16392579Application Date: 2019-04-23
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Publication No.: US11043601B2Publication Date: 2021-06-22
- Inventor: Jiun Shiung Wu , Ya-Chin King , Chrong-Jung Lin
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/788 ; H01L27/10 ; H01L27/105 ; H01L27/115 ; H01L27/11519 ; H01L27/11524 ; H01L27/11526 ; H01L29/78

Abstract:
A non-volatile memory cell is described. The non-volatile memory cell includes a substrate, insulators, a floating gate and a control gate. The substrate has a first fin and a second fin, wherein the second fin is located at a first side of the first fin and a conductive type of the second fin is different from that of the first fin. The insulators are located over the substrate, wherein the first fin and the second fin are respectively located between the insulators. The floating gate is located over the first fin, the insulators and the second fin. The control gate includes the second fin.
Public/Granted literature
- US20190252552A1 NON-VOLATILE MEMORY CELL AND NON-VOLATILE MEMORY Public/Granted day:2019-08-15
Information query
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