Invention Grant
- Patent Title: Perpendicular magnetoresistive elements
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Application No.: US16824657Application Date: 2020-03-19
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Publication No.: US11043631B2Publication Date: 2021-06-22
- Inventor: Yimin Guo
- Applicant: Yimin Guo
- Applicant Address: US CA San Jose
- Assignee: Yimin Guo
- Current Assignee: Yimin Guo
- Current Assignee Address: US CA San Jose
- Main IPC: H01L43/10
- IPC: H01L43/10 ; H01L43/02 ; H01L43/12 ; H01L27/22 ; H01F41/32 ; G11C11/16 ; H01F10/32

Abstract:
A perpendicular magnetoresistive element includes a novel buffer layer having rocksalt crystal structure interfacing to a CoFeB-based recording tri-layer has (100) plane parallel to the substrate plane and with {110} lattice parameter being slightly larger than the bcc CoFe lattice parameter along {100} direction, and crystallization process of amorphous CoFeB material in the recording layer during thermal annealing leads to form bcc CoFe grains having epitaxial growth with in-plane expansion and out-of-plane contraction. Accordingly, a perpendicular anisotropy, as well as a perpendicular magnetization, is induced in the recording layer. The invention preferably includes materials, configurations and processes of perpendicular magnetoresistive elements suitable for perpendicular spin-transfer torque MRAM applications.
Public/Granted literature
- US20200220071A1 PERPENDICULAR MAGNETORESISTIVE ELEMENTS Public/Granted day:2020-07-09
Information query
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