Invention Grant
- Patent Title: Quantum dot film having porous structure and manufacturing method for the same
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Application No.: US16212798Application Date: 2018-12-07
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Publication No.: US11043647B2Publication Date: 2021-06-22
- Inventor: Yeon Sik Jung , Duk Young Jeon , Geon Yeong Kim , Jin Young Choi , Chul Hee Lee , Hun Hee Lim
- Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Daejeon
- Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Daejeon
- Main IPC: H01L51/50
- IPC: H01L51/50 ; H01L51/00
Abstract:
The present disclosure relates to a quantum dot film including a self-assembled block copolymer, and a quantum dot bonded to the block copolymer, wherein the film has pores with an average diameter of 100-3000 nm inside.
Information query
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