Invention Grant
- Patent Title: Methods and apparatus for conserving electronic device manufacturing resources
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Application No.: US15598243Application Date: 2017-05-17
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Publication No.: US11049735B2Publication Date: 2021-06-29
- Inventor: Daniel O. Clark , Phil Chandler , Jay J. Jung
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; C23C14/56 ; C23C16/44 ; B01D53/38 ; B01D53/74
Abstract:
A method for operating an electronic device manufacturing system is provided that includes introducing an inert gas into a process tool vacuum pump at a first flow rate while the process tool is operating in a process mode, and introducing the inert gas into the process tool vacuum pump at a second flow rate while the process tool is operating in a chamber clean mode. Numerous other embodiments are provided.
Public/Granted literature
- US20170256425A1 METHODS AND APPARATUS FOR CONSERVING ELECTRONIC DEVICE MANUFACTURING RESOURCES Public/Granted day:2017-09-07
Information query
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