Invention Grant
- Patent Title: System and related methods for monitoring and adjusting actual seed depths during a planting operation
-
Application No.: US16152836Application Date: 2018-10-05
-
Publication No.: US11051446B2Publication Date: 2021-07-06
- Inventor: Ivan Antich
- Applicant: CNH Industrial America LLC
- Applicant Address: US PA New Holland
- Assignee: CNH Industrial America LLC
- Current Assignee: CNH Industrial America LLC
- Current Assignee Address: US PA New Holland
- Agent Rebecca L. Henkel; Rickard K. DeMille
- Main IPC: A01B49/06
- IPC: A01B49/06 ; A01C7/06 ; A01C7/10 ; A01B63/16 ; A01B76/00

Abstract:
In one aspect, a method is disclosed for adjusting a seed depth associated with depositing a seed within a furrow in a field during a planting operation of an agricultural implement. The method may include sensing, by a computing device, a seed depth parameter indicative of a seed depth of the seed relative to a ground surface of the field; comparing, by the computing device, the seed depth parameter to a target seed depth parameter, the target seed depth parameter describing a target seed depth; and initiating, by the computing device, a control action configured to adjust the seed depth parameter towards the target seed depth parameter.
Information query