Invention Grant
- Patent Title: Methods for laser processing transparent workpieces using pulsed laser beam focal lines and vapor etching
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Application No.: US16776055Application Date: 2020-01-29
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Publication No.: US11052481B2Publication Date: 2021-07-06
- Inventor: Heather Debra Boek , Andreas Simon Gaab , Garrett Andrew Piech , Alranzo Boh Ruffin , Daniel Arthur Sternquist , Michael Brian Webb
- Applicant: CORNING INCORPORATED
- Applicant Address: US NY Corning
- Assignee: CORNING INCORPORATED
- Current Assignee: CORNING INCORPORATED
- Current Assignee Address: US NY Corning
- Agent Smit Kapadia
- Main IPC: B23K26/00
- IPC: B23K26/00 ; B23K26/362

Abstract:
A method for processing a transparent workpiece includes directing a pulsed laser beam into the transparent workpiece such that a portion of the pulsed laser beam directed into the transparent workpiece generates an induced absorption within the transparent workpiece, thereby forming a damage line within the transparent workpiece, and the portion of the pulsed laser beam directed into the transparent workpiece includes a wavelength λ, a spot size w0, and a Rayleigh range ZR that is greater than F D π w 0 2 λ , where FD is a dimensionless divergence factor comprising a value of 10 or greater. Further, the method for processing the transparent workpiece includes etching the transparent workpiece with an etching vapor to remove at least a portion of the transparent workpiece along the damage line, thereby forming an aperture extending through the at least a portion of the thickness of the transparent workpiece.
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