Invention Grant
- Patent Title: Structure containing Sn layer or Sn alloy layer
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Application No.: US16769545Application Date: 2018-11-27
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Publication No.: US11052637B2Publication Date: 2021-07-06
- Inventor: Shoya Iuchi , Masaru Hatabe , Takahiro Tanaka , Fuka Yamaoka
- Applicant: ISHIHARA CHEMICAL CO., LTD.
- Applicant Address: JP Kobe
- Assignee: ISHIHARA CHEMICAL CO., LTD.
- Current Assignee: ISHIHARA CHEMICAL CO., LTD.
- Current Assignee Address: JP Kobe
- Agency: Knobbe, Martens, Olson & Bear LLP
- Priority: JPJP2017-232888 20171204
- International Application: PCT/JP2018/043613 WO 20181127
- International Announcement: WO2019/111767 WO 20190613
- Main IPC: B32B15/01
- IPC: B32B15/01 ; B32B15/04 ; B32B15/18 ; C25D3/12 ; C25D3/30 ; C25D5/14 ; H01L23/532

Abstract:
A structure containing a Sn layer or a Sn alloy layer includes a substrate, a Sn layer or Sn alloy layer formed above the substrate, and an under barrier metal formed between the substrate and the Sn layer or Sn alloy layer in the form of a single metal layer containing any one of Fe, Co, Ru and Pd, or an alloy layer containing two or more of Fe, Co, Ru and Pd.
Public/Granted literature
- US20200376808A1 STRUCTURE CONTAINING SN LAYER OR SN ALLOY LAYER Public/Granted day:2020-12-03
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