Invention Grant
- Patent Title: Spray granulation of silicon dioxide in the preparation of quartz glass
-
Application No.: US16062366Application Date: 2016-12-16
-
Publication No.: US11053152B2Publication Date: 2021-07-06
- Inventor: Matthias Otter , Mirko Wittrin , Markus Wilde
- Applicant: Heraeus Quarzglas GmbH & Co. KG
- Applicant Address: DE Hanau
- Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee Address: DE Hanau
- Agency: Dicke, Billig & Czaja, PLLC
- Priority: EP15201148 20151218
- International Application: PCT/EP2016/081451 WO 20161216
- International Announcement: WO2017/103125 WO 20170622
- Main IPC: C03B17/04
- IPC: C03B17/04 ; C03B20/00 ; C01B33/18 ; G02B6/02 ; C03C3/06 ; C03B19/10 ; F26B3/12 ; C03B37/012 ; C03C1/02

Abstract:
One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate, making a glass melt out of the silicon dioxide granulate, and making a quartz glass body out of at least a part of the glass melt. In one aspect, providing a silicon dioxide granulate includes providing of a silicon dioxide powder and processing of the powder to obtain a silicon dioxide granulate including the spray drying of a silicon dioxide slurry using a nozzle. The nozzle has a contact surface to the slurry made of glass, plastic or a combination thereof. Furthermore, one aspect relates to a quartz glass body obtainable by this process. Furthermore, one aspect relates to the preparation of a silicon dioxide granulate. One aspect also relates to a light guide, an illuminant, and a formed body, made from processing of the quartz glass body.
Public/Granted literature
- US20190077691A1 SPRAY GRANULATION OF SILICON DIOXIDE IN THE PREPARATION OF QUARTZ GLASS Public/Granted day:2019-03-14
Information query