Invention Grant
- Patent Title: Photocurable composition
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Application No.: US16836946Application Date: 2020-04-01
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Publication No.: US11053328B2Publication Date: 2021-07-06
- Inventor: Keisuke Kawashima , Koso Matsuno
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPJP2019-077036 20190415
- Main IPC: C08F2/46
- IPC: C08F2/46 ; C08F2/50 ; C08G61/04 ; C08F2/48 ; C08F2/52 ; C08F20/18 ; C08F20/32 ; C08G75/26 ; C08K5/07 ; C08K5/31

Abstract:
Provided is a photocurable composition including a component (A) which is an acrylic ester compound containing one or more acryloyl groups in one molecule; a component (B) which is an acrylic ester compound containing one or more acryloyl groups and one or more epoxy groups in one molecule; a component (C) which is a compound containing two or more thiol groups in one molecule; a component (D) which is a photoradical generator; and a component (E) which is a photobase generator, in which a ratio between a total mass of the component (A) and the component (B) and a mass of the component (C) is in a range of 67.8:32.2 to 88.0:12.0, inclusive.
Public/Granted literature
- US20200325252A1 PHOTOCURABLE COMPOSITION Public/Granted day:2020-10-15
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