Invention Grant
- Patent Title: Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method
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Application No.: US16608050Application Date: 2018-04-27
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Publication No.: US11053339B2Publication Date: 2021-07-06
- Inventor: Azusa Oshita , Minori Takegoshi , Mitsuru Kato , Chihiro Okamoto , Shinya Kato
- Applicant: KURARAY CO., LTD.
- Applicant Address: JP Kurashiki
- Assignee: KURARAY CO., LTD.
- Current Assignee: KURARAY CO., LTD.
- Current Assignee Address: JP Kurashiki
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2017-095378 20170512
- International Application: PCT/JP2018/017200 WO 20180427
- International Announcement: WO2018/207670 WO 20181115
- Main IPC: C08G18/38
- IPC: C08G18/38 ; B24B37/24 ; C08G18/32 ; C08G18/76 ; H01L21/3105 ; H01L21/321 ; C08G18/08 ; B24D3/00 ; B24D3/34
Abstract:
Disclosed herein are polyurethanes useful for polishing layers, where the polyurethane is a polyurethane having a Schiff base. Also disclosed herein are polishing layers containing the polyurethanes, polishing methods that use the polishing layers, and a modification method including a step of converting the Schiff base into at least one functional group selected from an aldehyde group, a carboxylic acid group, a hydroxyl group, and an amino group.
Information query
